Kääriäinen, Tommi. <br/><br/>
Atomic layer deposition :  principles, characteristics, and nanotechnology applications / 
Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman. 
 - 2/e 
 - xv, 253 p :  illustrations ;  25 cm 
<br/><br/>Includes bibliographical references and index. 
<br/><br/><label>ISBN: </label>9781118062777 
<br/><br/><label>LCCN: </label>2013016209 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Chemical vapor deposition.<br/>Epitaxy.<br/>Microelectronics.<br/>Nanotechnology.<br/>Atomic layer deposition.
<br/><br/><label>Dewey Class. No.: </label>620.5  / KAA